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name of an article
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specifications
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Models
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New UVE-M552-A 5Kw parallel light exposure machine
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Machine size
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1400mm(w)X2850mm(D)X2250mm(H)
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Power Supply
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AC380V，30，50HZ/60HZ，100A
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light source
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5Kw, short arc, mercury /Xenon 365nm, suitable for manufacturing high-density circuit board-cold light source (no infrared ray, which is beneficial to film protection).
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Lamp cooling
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Independent lamp source air cooling system
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Ray parallelism
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<2.0
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Mesa exposure energy
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18mw/cm2 (exposure area 24"x30 "
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Table cooling mode
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Forced air cooling
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Exposure mode
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Normally bright shutter type, light energy metering or standard time control, sequential exposure of upper and lower lights.
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vacuum system
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Oil-free vacuum pump, high vacuum degree, suitable for manufacturing thin lines.
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Effective exposure area
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610mmX760mm 24 "*30".
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Exposure table
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MYLAR glass X2 electromagnetic lock control
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Exposure uniformity
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90%
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Exposure accuracy
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2/2
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Exposure environment
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The exposure room uses 100-level filtered clean air to generate positive pressure, which effectively prevents dust from entering.
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Exposure controller
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Intelligent man-machine interface, energy product control system
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Environmental coordination equipment
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(1) The exhaust pipe is 250mm and 1100 m‘/h.
(2) (2) The NEB specification of 19 kva power system is three-phase 100A.
(3) (3) compressed air 600L/Min,6Bar.
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Mode of operation
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Touch screen operation interface+programmable controller.
(With multi-point fault self-check and error warning)
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Warranty matters
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(1) After-sales service of replacement and repair of faulty parts free of charge for one year after delivery, except for natural disasters or human negligence.
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