|
name of an article |
specifications |
|
Models |
New UVE-M552-A 5Kw parallel light exposure machine |
|
Machine size |
1400mm(w)X2850mm(D)X2250mm(H) |
|
Power Supply |
AC380V，30，50HZ/60HZ，100A |
|
light source |
5Kw, short arc, mercury /Xenon 365nm, suitable for manufacturing high-density circuit board-cold light source (no infrared ray, which is beneficial to film protection). |
|
Lamp cooling |
Independent lamp source air cooling system |
|
Ray parallelism |
<2.0 |
|
Mesa exposure energy |
18mw/cm2 (exposure area 24"x30 " |
|
Table cooling mode |
Forced air cooling |
|
Exposure mode |
Normally bright shutter type, light energy metering or standard time control, sequential exposure of upper and lower lights. |
|
vacuum system |
Oil-free vacuum pump, high vacuum degree, suitable for manufacturing thin lines. |
|
Effective exposure area |
610mmX760mm 24 "*30". |
|
Exposure table |
MYLAR glass X2 electromagnetic lock control |
|
Exposure uniformity |
90% |
|
Exposure accuracy |
2/2 |
|
Exposure environment |
The exposure room uses 100-level filtered clean air to generate positive pressure, which effectively prevents dust from entering. |
|
Exposure controller |
Intelligent man-machine interface, energy product control system |
|
Environmental coordination equipment |
(1) The exhaust pipe is 250mm and 1100 m‘/h. (2) (2) The NEB specification of 19 kva power system is three-phase 100A. (3) (3) compressed air 600L/Min,6Bar. |
|
Mode of operation |
Touch screen operation interface+programmable controller. (With multi-point fault self-check and error warning) |
|
Warranty matters |
(1) After-sales service of replacement and repair of faulty parts free of charge for one year after delivery, except for natural disasters or human negligence. |
